Effect of Substrate Temperature and Deposition Power on the Surface Morphology and Optical Properties of ZnO:Mg Thin Films Deposited by DC Magnetron Sputtering

Authors

Saidi Saidi, Baobab Secondary School, Mapinga Village, Bagamoyo District, Dar es Salaam, Tanzania.Follow
Margaret E. Samiji, Physics Department, University of Dar es Salaam, Dar es Salaam, Tanzania.Follow
Nuru R. MlyukaFollow

Section

Physical Sciences

Abstract

Magnesium doped zinc oxide (ZnO:Mg) thin films were deposited on soda lime glass slides by DC magnetron sputtering method. Atomic force microscope (AFM), and UV/VIS spectrophotometer were used to investigate the effect of sputtering power and substrate temperature on the surface morphology and optical properties of ZnO:Mg thin films. AFM images revealed that sputtering power and deposition temperature have significant influence on surface morphology of the ZnO:Mg thin films. For all sputtering powers and substrate temperatures investigated, ZnO:Mg films had peak transmittance above 85%. Samples deposited at 110 W sputtering power and 450 °C substrate temperature showed the best peak transmittance of > 90% at 560 nm (visible range). Optical band gap of ZnO:Mg films was in the range of 3.44– 3.69 eV depending on the substrate temperature. The results indicated the potential of the films for transparent conductor applications.

Recommended Citation

Saidi, Saidi; Samiji, Margaret E.; and Mlyuka, Nuru R. (2024) "Effect of Substrate Temperature and Deposition Power on the Surface Morphology and Optical Properties of ZnO:Mg Thin Films Deposited by DC Magnetron Sputtering," Tanzania Journal of Science: Vol. 49: Iss. 5, Article 9.
Available at:https://doi.org/10.4314/tjs.v49i5.9